Laser writer
Laser engraving technology
Scanning distance:0.65mm
Scanning mode:Raster
Accuracy: 5nm
E-Beam writer
Electronic beam engraving technology
Scanning distance:depending on the beam spot
Scanning mode:Raster & Vector
Accuracy:depending on the beam spot (approx. 25nm)

*  WUXI CHINA RESOURCES MICROELECTRONICS CO.,LTD MASK FACTORY has developed electronic beam and laser processing technologies and boasts the most advanced UV exposure machine.


WUXI DIS Microelectronics Co.,Ltd. is one of the earliest professional enterprises engaged in the production of mask. It owns domestically leading and comprehensive photomask manufacturing equipment, world-class facilities, excellent processes and technologies, strict quality control and information security protection. Persisting in its concept and pursuit of “Creating the value for customers and growing with customers”, CR Micro Mask has been the preferred partner of many IC design companies and wafer manufacturers in China.  

0.18um Stepper mask or bigger
3”x5”UT mask
1:1 Array mask
Copy photomask
Professional customer service
Remote data check
Notification of engraving schedule
Data generation and format conversion

二八杠生死门详细讲解 江西11选五多乐彩 甘肃快三开奖数据 pc蛋蛋的高级自动投注 快乐8游戏规则 辽宁福彩快乐12选五 陕西11选五开奖结果走势图一定牛 四川快乐12走势图怎么看 河南11选五开奖走势图 百度 理财和炒股的区别 江苏快3计划 美国股票历史走势 拖码胆码 贵州省快快3走势图 下期排列五专家杀号码 广西快乐双彩开奖详情 期货配资一般都是多少